DAS Achieves World’s First Point-of-Use Abatement of Harmful Gases in Wet Bench Semiconductor Processes
DRESDEN, Germany, July 15, 2013 – Responding with a breakthrough approach to a major semiconductor customer request, DAS Environmental Expert GmbH of Dresden, Germany, developed and installed SALIX – the world’s first and only commercially available point-of-use system for removing waste gas pollutants in semiconductor wafer manufacturing wet bench applications – and, after six months of evaluation, today announced it is proven fully effective. DAS believes its unique approach of using a high-efficiency, small footprint point-of-use system … Read More → "DAS Achieves World’s First Point-of-Use Abatement of Harmful Gases in Wet Bench Semiconductor Processes"

