Imec first to stack FinFETS with 45nm fin pitch using sequential 3D integration
SAN FRANCISCO (USA), DECEMBER 3, 2018 — At this week’s IEEE IEDM 2018 conference, imec, the world-leading research and innovation hub in nanoelectronics and digital technologies, presents a first demonstration of 3D stacked FinFETs on 300mm wafers using a sequential integration approach with a 45nm fin pitch and 110nm poly pitch technology. The top layer consists of junction-less devices fabricated at a temperature below 525 degrees Celsius in a silicon layer transferred by wafer-to-wafer bonding. The excellent performance of the resulting stack demonstrates how the 3D sequential approach can be deployed to obtain an aggressive device … Read More → "Imec first to stack FinFETS with 45nm fin pitch using sequential 3D integration"

