Synopsys and TSMC Collaborate for 20nm Reference Flow
MOUNTAIN VIEW, Calif., Oct. 15, 2012 /PRNewswire/ —
Highlights:
- TSMC 20nm Reference Flow deployed by early adopters for design enablement
- Flow provides proven support for double patterning, pre-coloring, pattern matching, multi-valued SPEF
- Flow includes Synopsys’ Design Compiler®, IC Compiler™, StarRC™, PrimeTime® and IC Validator tools
Synopsys, Inc. (Nasdaq: SNPS), a global leader accelerating innovation in the design, verification and manufacture of chips and systems, today announced 20-nanometer (nm) process technology support for the TSMC 20nm Reference flow. This includes Synopsys® Galaxy™ Implementation Platform support for the latest TSMC 20 … Read More → "Synopsys and TSMC Collaborate for 20nm Reference Flow"

