Elk Grove, Calif., November 13, 2018 — Accellera Systems Initiative (Accellera), the electronics industry organization focused on the creation and adoption of electronic design automation (EDA) and intellectual property (IP) standards, announced today that the Accellera Universal Verification Methodology (UVM) Working Group has released the UVM 2017-1.0 reference implementation.
“We have been very focused on updating the UVM reference implementation to match the new IEEE 1800.2 standard,” stated Justin Refice, Chair of the UVM Working Group. “We are aligned with the enhancements that make it more powerful and easier to use, and we have worked hard to address some inconsistencies between the UVM Register Layer and other standards. Our working group received a lot of feedback on the 0.9 release, and we were able to fix the bugs that were reported. UVM 2017-1.0 also includes full documentation of the API that is provided in addition to 1800.2-2017.”
The UVM 2017-1.0 reference implementation can be downloaded for free from Accellera. The IEEE 1800.2-2017 standard is available free of charge from the IEEE Get program, courtesy of Accellera. Visit the UVM forum to provide feedback, ask questions, and engage in discussions. For more information on UVM, visit the UVMcommunity page.
About Accellera Systems Initiative
Accellera Systems Initiative is an independent, not-for profit organization dedicated to create, support, promote and advance system-level design, modeling and verification standards for use by the worldwide electronics industry. The organization accelerates standards development and, as part of its ongoing partnership with the IEEE, its standards are contributed to the IEEE Standards Association for formal standardization and ongoing change control. For more information, please visit www.accellera.org. Find out more about membership here. Follow @accellera on Twitter or to comment, please use #accellera. Accellera Global Sponsors are: Cadence Design Systems, Inc.; Mentor, A Siemens Business; and Synopsys, Inc.
