industry news
Subscribe Now

Mentor Graphics and NuFlare Technology Extend Collaboration to Address Advanced Maskwriting Challenge

WILSONVILLE, Ore., Sep. 20, 2011 – Mentor Graphics Corporation (Nasdaq: MENT) and NuFlare Technology, Inc. (Jasdaq: 6256) today announced the extension of their successful collaboration on integrated hardware and software solutions for advanced IC mask generation. The companies’ new joint marketing and support agreement will help ensure seamless interfaces, high mask fidelity, fast mask writing times, and very high levels of technical support. 

The new agreement covers the Mentor Graphics® Calibre® FRACTUREt™, Calibre FRACTUREv™, Calibre MDPmerge™, Calibre MDPverify™, Calibre nmMPC and Calibre MDPview™ products. These are used with NuFlare mask writers starting with the EBM-3000, all the way up to the EBM-8000 series, and are being expanded for future generation machines to perform data preparation, process correction and verification of mask data to improve the fidelity of the final mask pattern. NuFlare will also use Mentor tools to explore innovations during research and development, to verify new product features, and to assist in customer support. Past efforts between Mentor and NuFlare have resulted in the definition of an OASIS.MASK input interface and the definition of format extensions to carry dose annotation for advanced mask writing on future generation tools.  

“Mentor is the recognized industry leader in OPC, MDP and MPC, and has proven to be a reliable and innovative strategic partner during our longstanding collaboration to date,” said Kiyoshi Hattori, director and general manager of NuFlare’s Mask Lithography Engineering department. “Our engagement has delivered many benefits for our mutual customers in OASIS.MASK support, mask process correction advances, and mask write time reduction techniques.”

“We’re very pleased to extend our relationship with NuFlare, an acknowledged leader in mask writing equipment. Our close cooperation has provided many technology and service benefits to our mutual customers,” said Joseph Sawicki, vice president and general manager of the Mentor Design to Silicon division. “We look forward to tackling the significant challenges of advanced IC manufacturing together as we push beyond the historical limits of IC scaling.” 

About Mentor Graphics 

Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues over the last 12 months of about $915 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.

About NuFlare Technology, Inc. 

NuFlare Technology, Inc. (JASDAQ: 6256) is a supplier of mask writing systems, mask inspection systems, and epitaxial reactor systems.  NuFlare has the world’s top market share in e-beam mask writing systems and is a technology leader in mask writing systems with its production, R&D and support sites in Japan, USA, Germany, Korea and Taiwan.  In fiscal year 2010/2011, NuFlare Technology, Inc. generated consolidated revenues of over JPY 30 billion.  Headquarters are located at Shin-Yokohama Business Center Bldg. 10F, 3-2-6, Shin-Yokohama, Kohoku-ku, Yokohama, Kanagawa, Japan 222-0033.  World Wide Web site: http://www.nuflare.co.jp.  

Leave a Reply

featured blogs
Apr 24, 2026
A thought experiment in curiosity, confusion, and cosmic consequences....

featured paper

Quickly and accurately identify inter-domain leakage issues in IC designs

Sponsored by Siemens Digital Industries Software

Power domain leakage is a major IC reliability issue, often missed by traditional tools. This white paper describes challenges of identifying leakage, types of false results, and presents Siemens EDA’s Insight Analyzer. The tool proactively finds true leakage paths, filters out false positives, and helps circuit designers quickly fix risks—enabling more robust, reliable chip designs. With detailed, context-aware analysis, designers save time and improve silicon quality.

Click to read more

featured chalk talk

GaN for Humanoid Robots
Sponsored by Mouser Electronics and Infineon
In this episode of Chalk Talk, Eric Persson and Amelia Dalton explore why power is the key driver for efficient and reliable robot movements and how GaN technologies can help motor control solutions be more compact, integrated and efficient. They also investigate the role of field-oriented control in humanoid robotic applications and why the choice of a GaN power transistor can make all the difference in your next humanoid robot project!
Apr 20, 2026
9,964 views