editor's blog
Subscribe Now

TSVs: Like Vias, Only 1000X Deeper

We recently looked at Applied Materials’ solution to the challenges of lining small vias: using cobalt. But those are through-dielectric vias. What about through-silicon vias (TSVs)? After all, they can be a thousand times deeper than a standard via, so if a standard via is hard to cover, imagine how hard it must be for a TSV.

Of course, we’re talking a wider via, but AMAT says that standard physical vapor deposition (PVD) tools do an inadequate job of coating the TSVs when applying the barrier, for lots of the same reasons we discussed in the cobalt story.

Their solution to the TSV issue isn’t quite as radical as a new metal; it involves tightening up the angle of dispersion for the metals, providing better coverage. With better coverage, the barrier can also be made thinner, saving cost. A thinner layer is faster to deposit, improving throughput (and reducing cost).

Figure.png

 

(Image courtesy Applied Materials)

In addition, they’ve built a production-worthy chamber for use with titanium rather than the more typical “proven” tantalum. Titanium apparently being cheaper than tantalum. Both can be integrated with the copper seed.

You can read more about their Ventura PVD in their announcement.

Leave a Reply

featured blogs
Nov 30, 2023
No one wants to waste unnecessary time in the model creation phase when using a modeling software. Rather than expect users to spend time trawling for published data and tediously model equipment items one by one from scratch, modeling software tends to include pre-configured...
Nov 27, 2023
See how we're harnessing generative AI throughout our suite of EDA tools with Synopsys.AI Copilot, the world's first GenAI capability for chip design.The post Meet Synopsys.ai Copilot, Industry's First GenAI Capability for Chip Design appeared first on Chip Design....
Nov 6, 2023
Suffice it to say that everyone and everything in these images was shot in-camera underwater, and that the results truly are haunting....

featured video

TDK CLT32 power inductors for ADAS and AD power management

Sponsored by TDK

Review the top 3 FAQs (Frequently Asked Questions) regarding TDK’s CLT32 power inductors. Learn why these tiny power inductors address the most demanding reliability challenges of ADAS and AD power management.

Click here for more information

featured paper

3D-IC Design Challenges and Requirements

Sponsored by Cadence Design Systems

While there is great interest in 3D-IC technology, it is still in its early phases. Standard definitions are lacking, the supply chain ecosystem is in flux, and design, analysis, verification, and test challenges need to be resolved. Read this paper to learn about design challenges, ecosystem requirements, and needed solutions. While various types of multi-die packages have been available for many years, this paper focuses on 3D integration and packaging of multiple stacked dies.

Click to read more

featured chalk talk

Advantech Industrial AI Camera: Small but Mighty
Sponsored by Mouser Electronics and Advantech
Artificial intelligence equipped camera systems can be a great addition to a variety of industrial designs. In this episode of Chalk Talk, Amelia Dalton and Ryan Chan from Advantech explore the components included in an industrial AI camera system, the benefits of Advantech’s AI ICAM-500 Industrial camera series and how you can get started using these solutions in your next industrial design. 
Aug 23, 2023
11,969 views