EU funded microelectronics project launched to enhance lithography-based yield
Copenhagen, Denmark, February 17, 2010 — Supported by funding from the European Union’s Seventh Framework Programme, a consortium of eight leading institutions has launched a joint microelectronics research project aiming to develop innovative design methods and related EDA tools which remove the limitations in physical implementation effectiveness associated with technology scaling and advanced sub-wavelength lithography. The Synaptic consortium is composed of eight leading institutions, including four European technology companies, a European world-leading research institute in the field of nanoelectronics, and three academic institutions, two from Europe and one from … Read More → "EU funded microelectronics project launched to enhance lithography-based yield"

