Nanoplas Announces Important New 14nm Order and Joint Development Agreement with CEA-Leti
ST-ÉGRÈVE, France – November 13, 2013 – Nanoplas, a global supplier of plasma processing equipment to the semiconductor industry, today announced a second purchase order for an ALDE® (Atomic Layer Downstream Etching) process module for extreme selectivity dielectric dry-etching. As the company foresees many different applications at 14nm and beyond, Nanoplas also announced a Joint Development Agreement (JDA) with CEA-Leti, extending the technology to additional applications in 14nm dry-etching, stripping and cleaning.
The new ALDE® order will enable … Read More → "Nanoplas Announces Important New 14nm Order and Joint Development Agreement with CEA-Leti"

