EUV Light Source Developer Adlyte Achieves Key Performance Milestone for High-Volume Manufacturing
ZUG, Switzerland, October 22, 2014 – Adlyte Inc., a developer of high-brightness extreme light sources for advanced semiconductor inspection and metrology applications, today announced it has reached a key performance benchmark for its extreme ultraviolet (EUV) light source for high-volume manufacturing (HVM)-readiness. Adlyte has demonstrated that its EUV light source has maintained clean operation after intermediate focus while running for hundreds of hours replicating multiple parameters for a production environment-including power, brightness and uptime-established by mask inspection original equipment manufacturers (OEMs). Reaching this milestone is the latest example of Adlyte’s … Read More → "EUV Light Source Developer Adlyte Achieves Key Performance Milestone for High-Volume Manufacturing"

