Cymer Announces Shipment of its First XLR 700ix DUV Light Source and Introduces DynaPulse
San Jose, California, February 23, 2015 – Cymer, an ASML company, an industry leader in developing lithography light sources used by chipmakers to pattern advanced semiconductor chips, today announced the shipment of its first XLR® 700ix light source. Enabling higher scanner throughput and process stability for 14nm chip manufacturing and beyond, the XLR 700ix provides improvements in bandwidth, wavelength and energy stability to reduce process variability and increase yield through improvements in wafer critical dimension (CD) uniformity; software enhancements to increase light source predictability and availability; and reduction in helium and power consumption to decrease operating costs.

