Mentor Graphics Customers Expand Use of Calibre Pattern Matching to Tackle Toughest IC Verification and Manufacturing Problems
Highlights:
• Customers and ecosystem partners are expanding use of the Calibre® Pattern Matching solution to overcome complex integrated circuit (IC) verification and manufacturing problems.
• The solution integrates all Calibre tools and flows to drive new applications in physical verification, design for manufacturability (DFM), yield enhancement, and failure analysis.
• In use across a wide range of IC design companies, process technologies, and foundries, including eSilicon, Samsung Foundry and SMIC.
WILSONVILLE, Ore., June 1, 2016—Mentor … Read More → "Mentor Graphics Customers Expand Use of Calibre Pattern Matching to Tackle Toughest IC Verification and Manufacturing Problems"

