WILSONVILLE, Ore., December 21, 2012—Mentor Graphics Corp. (NASDAQ: MENT) today announced comprehensive design, manufacturing, and post tapeout enabling support for Samsung’s 14nm IC manufacturing processes, providing customers with a complete design-to-silicon flow concurrent with early process availability. The fully interoperable Mentor® flow helps customers achieve fast design cycles and first time silicon success.
The Mentor solutions optimized for Samsung’s 14nm offerings include the Calibre® platform with design rule checking (DRC), LVS checking, extraction, design for manufacturing (DFM) and advanced fill, as well as the Tessent® design for test (DFT) suite and yield analysis … Read More → "Mentor Graphics Announces Comprehensive Design Enablement Platform for Samsung’s 14nm IC Manufacturing Process"