Leti and EVG Launch INSPIRE, a Lithography Program Aimed At Demonstrating Benefits of Nano-imprint Technology
GRENOBLE, France, and ST. FLORIAN AM INN, Austria – July 15, 2015 – CEA-Leti and EV Group have launched a new program in nano-imprint lithography (NIL) called INSPIRE to demonstrate the benefits of the versatile, powerful nano-patterning technology and spread its use for applications beyond semiconductors.
In addition to creating an industrial partnership to develop NIL process solutions, the INSPIRE program is designed to demonstrate the technology’s cost-of-ownership benefits for a wide range of application domains, such as photonics, plasmonics, lighting, photovoltaics, wafer-level optics and bio-technology.

