May 15, 2014, Campbell, CA – Noel Technologies, a Silicon Valley specialty foundry offering process development and substrate fabrication, is now offering services for nanoimprint technology that reduce the costs of the nanoimprint stamps.

Working with clients in the nanoimprinting marketplace, Noel is developing thin film deposition techniques with optical lithography to lessen the costs associated with producing the stamps. Also, Noel has been working with different stamp materials and films to shrink the critical dimensions (CD) down to the .2-micron range.

These film deposition and shrinking techniques can reduce the CD of holes, pillows and posts in nanoimprint technology to produce less expensive stamps with faster turnaround.  Noel offers a wide range of passivation films to shrink the dimensions:  LPCVD nitride, LPCVD undoped poly, LPCVD amorphous silicon as well as PECVD TEOS, PECVD SiO2, PECVD amorphous silicon & PECVD amorphous carbon.

By utilizing their broad process expertise, these processing techniques can bridge the gap to the much more expensive, leading-edge immersion lithography, a typical technology now used to produce nanoimprint stamps.

About Noel Technologies:

Noel Technologies, Inc. is a Silicon Valley based foundry focused on process development, optimization, quality and delivery. An ISO 9001 registered facility, Noel Technologies offers process development and fabrication from 50mm up to 300mm and several services for 450mm. They work with transparent and other non-standard substrates in addition to standard technologies. As the increasing costs of technology R&D, along with slower revenue growth, continue to drive the expansion of the fabless model, Noel Technologies is strategically positioned to provide IDMs with a bridge from lab idea to fabrication. www.noeltech.com