eBeam Initiative to Expand Education Efforts on eBeam Technology Requirements for EUV and Nanoimprint Lithography
SAN JOSE, Calif., February 23, 2016–The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that it will expand its education efforts in 2016 to increase the industry’s focus on eBeam technology requirements and new developments to support extreme ultraviolet (EUV) lithography, nanoimprint lithography (NIL) and multi-beam mask writing. Each of these topics will be addressed by industry luminary guest speakers at the annual eBeam Initiative members and press luncheon event being held today during the SPIE Advanced Lithography Conference at the San Jose Convention Center.</ … Read More → "eBeam Initiative to Expand Education Efforts on eBeam Technology Requirements for EUV and Nanoimprint Lithography"