MOUNTAIN VIEW, Calif. and SHANGHAI, June 8, 2016 /PRNewswire/ —
Highlights:
- Technology advancements in the latest release of IC Compiler II deliver exceptional quality-of-results across all key metrics: Better performance, smaller area and lower power
- Speeds design setup and closure with pre-validated Synopsys Lynx Design System technology plug-in for SMIC 28-nm HKMG process
Semiconductor Manufacturing International Corporation (“SMIC”; NYSE: SMI; SEHK: 981), China’s largest and most advanced semiconductor foundry and one of the world’s largest foundries, and Synopsys, Inc. (NASDAQ: SNPS) today announced immediate availability of their joint 28-nanometer (nm) RTL-to-GDSII reference design flow. Developed through deep engineering collaboration between Synopsys and SMIC on the 28-nm High-K Metal Gate (HKMG) process technology, the flow is based on Synopsys’ Galaxy™ Design Platform using key features from the IC Compiler™ II place and route solution, Design Compiler® Graphical synthesis, StarRC™ extraction solution, PrimeTime® signoff solution and IC Validator physical verification solution.
Already deployed on hundreds of designs, IC Compiler II addresses today’s hypersensitive time-to-market needs by delivering superior quality of results and significant productivity gains with 10X faster design planning, 5X faster implementation and 2X more capacity. The reference flow features support for low-power techniques such as power-aware clock tree synthesis, power gating and physical optimization, enabled by industry standard IEEE-1801 UPF (Unified Power Format) power intent. Use of the reference flow allows designers to gain performance, power efficiency and chip density advantages while achieving predictable design closure.
The Lynx technology plug-in for the SMIC 28-nm HKMG process extends the reference flow to accelerate design setup and closure with Synopsys’ Lynx Design System, a full-chip design environment providing innovative automation and visualization capabilities. This plug-in includes additional process technology information and representative flow and tool settings that help reduce the time it takes to get to optimized design results.
“Designers require a reference flow that addresses both high-performance and low-power requirements,” said Tianshen Tang, senior vice president of Design Service at SMIC. “With the release of the SMIC-Synopsys 28-nanometer reference flow, we are enabling IC designers to accelerate release of their designs into manufacturing through the combination of SMIC’s 28-nanometer High-K Metal Gate process technology and Synopsys’ technology-leading design and IP solutions.”
“Our mutual customers have always been at the forefront of innovation,” said Bijan Kiani, vice president of marketing for the Design Group at Synopsys, Inc. “Through our collaboration with SMIC, we are delivering a proven high-performance, low-power reference flow and Lynx technology plug-in that utilize our industry-leading tools, including IC Complier II to accelerate design closure and tapeout readiness for SMIC’s 28-nanometer manufacturing process.”
Availability
The SMIC-Synopsys 28-nm Reference Flow is available now from SMIC. For more information, please visit http://www.smics.com/eng/design/reference_flows.php.
About SMIC
Semiconductor Manufacturing International Corporation (“SMIC”) (NYSE: SMI; SEHK: 981) is one of the leading semiconductor foundries in the world and the largest and most advanced foundry in mainland China. SMIC provides integrated circuit (IC) foundry and technology services at 0.35-micron to 28-nanometer. Headquartered in Shanghai, China, SMIC has a 300mm wafer fabrication facility (fab) and a 200mm mega-fab in Shanghai; a 300mm mega-fab and a majority owned 300mm fab under development for advance nodes in Beijing; and 200mm fabs in Tianjin and Shenzhen. SMIC also has marketing and customer service offices in the U.S., Europe, Japan, and Taiwan, and a representative office in Hong Kong. For more information, please visit www.smics.com.
